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Author: | Lipsanen, Antti |
Title: | Thermal Stability of Cu/WN/Si Contacts |
Cu/WN/Si kontaktien lämpöstabiilisuus | |
Publication type: | Master's thesis |
Publication year: | 2000 |
Pages: | 75 Language: eng |
Department/School: | Sähkö- ja tietoliikennetekniikan osasto |
Main subject: | Elektronifysiikka (S-69) |
Supervisor: | Kuivalainen, Pekka |
Instructor: | |
OEVS: | Electronic archive copy is available via Aalto Thesis Database.
Instructions Reading digital theses in the closed network of the Aalto University Harald Herlin Learning CentreIn the closed network of Learning Centre you can read digital and digitized theses not available in the open network. The Learning Centre contact details and opening hours: https://learningcentre.aalto.fi/en/harald-herlin-learning-centre/ You can read theses on the Learning Centre customer computers, which are available on all floors.
Logging on to the customer computers
Opening a thesis
Reading the thesis
Printing the thesis
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Location: | P1 Ark TKK 2707 | Archive |
Keywords: | diffusion barrier metallization tungsten nitride Cu Si diffuusiovalli metallointi volframinitridi |
ED: | 2000-10-03 |
INSSI record number: 15827
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