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Author: | Kannisto, Klaara |
Title: | Atomic Layer Deposition of Metal Thin Films |
Publication type: | Bachelor's thesis |
Publication year: | 2010 |
Pages: | 29 Language: eng |
Department/School: | Kemian ja materiaalitieteiden tiedekunta |
Degree programme: | Kemian tekniikan tutkinto-ohjelma |
Main subject: | Kemia (KE3001) |
Supervisor: | Linnekoski, Juha |
Instructor: | Malm, Jari ; Leskelä, Tuula |
Electronic version URL: | http://urn.fi/URN:NBN:fi:aalto-201305164420 |
Location: | |
Keywords: | atomic layer deposition metal thin films semiconductor microelectronics processing |
ED: | 2011-12-19 |
INSSI record number: 43299
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