search query: @supervisor Sopanen, Markku / total: 17
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Author: | Klonner, Maria |
Title: | Stamp Fabrication for ultraviolet Nanoimprint Lithography |
Publication type: | Master's thesis |
Publication year: | 2010 |
Pages: | [6] + 64 Language: eng |
Department/School: | Elektroniikan, tietoliikenteen ja automaation tiedekunta |
Main subject: | Optoelektroniikka (S-104) |
Supervisor: | Sopanen, Markku |
Instructor: | Ali, Muhammad |
Electronic version URL: | http://urn.fi/URN:NBN:fi:aalto-201203131430 |
OEVS: | Electronic archive copy is available via Aalto Thesis Database.
Instructions Reading digital theses in the closed network of the Aalto University Harald Herlin Learning CentreIn the closed network of Learning Centre you can read digital and digitized theses not available in the open network. The Learning Centre contact details and opening hours: https://learningcentre.aalto.fi/en/harald-herlin-learning-centre/ You can read theses on the Learning Centre customer computers, which are available on all floors.
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Location: | P1 Ark Aalto 877 | Archive |
Keywords: | UV Nanoimprint Lithography ALD stamp fabrication |
Abstract (eng): | This thesis investigates the fabrication of stamps for ultraviolet nanoimprint lithography (UV-NIL). UV-NIL is an attractive method for replacing optical lithography as a fabrication method as minimal size of the structures nears 20 nm. Stamp fabrication methods were analysed, compared, and tried. Finally, a fabrication process integrating a transparent conductive atomic layer deposition (ALD) layer to dissipate charges during the electron beam lithography (EBL) patterning process was chosen. The ALD layer was sandwiched between the glass substrate and a pattern layer of silicon dioxide. Various test patterns, such as dots and lines, were fabricated. After defining the patterns via EBL, they were transferred to the pattern layer via a plasma etching step. After pattern fabrication, the patterns were positioned on a mesa via a wet-etching step, producing a pedestal of about 15 µm height. Following the etching, the stamp was covered with a release layer, and the imprinting process on the NIL-addon of the mask aligner was investigated. The results were analysed and will be used for further improvement of the process. Imprinting was successfully demonstrated on several different substrates with different surface roughnesses. |
ED: | 2010-05-05 |
INSSI record number: 39551
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