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Author:Su, Jie
Title:Optimization of ТЮ2 Thin Film Growth at Different Temperatures by Atomic Layer Deposition
Publication type:Master's thesis
Publication year:2011
Pages:v + 52      Language:   eng
Department/School:Mikro- ja nanotekniikan laitos
Main subject:Optoelektroniikka   (S-104)
Supervisor:Lipsanen, Harri
Instructor:Huhtio, Teppo ; Bosund, Markus
Electronic version URL: http://urn.fi/URN:NBN:fi:aalto-201207022756
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Location:P1 Ark Aalto  1482   | Archive
Keywords:atomic layer deposition
titanium oxide
TiCl4
temperature
precursor pulsing
growth rate
uniformity
thickness variation
Abstract (eng): In this work TiO2 films were grown on silicon substrates by atomic layer deposition (ALD) using TiCl4 and H2O as precursors.
The effect of precursor pulse length and reaction temperature on the film growth rate and film uniformity was studied.
The film thickness and refractive indices were measured by ellipsometry.

The simulation of TiO2 growth with different TiCl4 pulsing lengths was carried out.
The results indicated that in an appropriate temperature range the growth rate and the uniformity are insensitive to a longer pulsing length.

In the temperature optimization experiment, TiO2 films with a small thickness variation of 1% - 4% and growth rate (0.4 Å - 0.5 Å/cycle) were obtained in the temperature range of 200 °C to 300 °C.
ED:2012-02-02
INSSI record number: 43904
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