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Author:Heikkilä, Niklas
Title:Electroplating current profile effects on deposited Cu
Publication type:Bachelor's thesis
Publication year:2016
Pages:31      Language:   eng
Department/School:Sähkötekniikan korkeakoulu
Degree programme:Bioinformaatioteknologian koulutusohjelma
Main subject:Bioinformaatioteknologia   (S121)
Supervisor:Turunen, Markus
Instructor:Ross, Glenn
Electronic version URL: http://urn.fi/URN:NBN:fi:aalto-201601211094
Location:  
Keywords:copper
electroplating
prc
pc
ED:2016-02-21
INSSI record number: 53082
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