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Author:Ristimäki, Ville
Title:Atomic layer deposition of dense mixed ionic-electronic conducting membrane on porous tubular substrate for oxygen combustion
Tiiviin yhdistetyn ioni-eletronijohtavan kalvon kasvatus atomikerroskasvatusmenetelmällä huokoiseen putkimaiseen substraattiin happipolttoa varten
Publication type:Master's thesis
Publication year:2012
Pages:(7) + 75 s. + liitt. 15      Language:   eng
Department/School:Energiatekniikan laitos
Main subject:Lämpötekniikka ja koneoppi   (Ene-39)
Supervisor:Lampinen, Markku
Instructor:Mäkelä, Milja
OEVS:
Electronic archive copy is available via Aalto Thesis Database.
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Location:P1 Ark Aalto  4758   | Archive
Keywords:ALD
tubular
dense
thin-film
porous
MIEC
putkimainen
tiivis
ohutkalvo
huokoinen
Abstract (eng): Atomic layer deposition thin film deposition technique was studied for producing robust and high performance mixed ionic-electronic conducting membranes for oxygen production.
Non-functional dense thin films were deposited on the inner surface of a mesoporous tubular alumina substrate and experiments were also done to coat mesoporous substrate material conformally.

Coating experiments were carried out with a flow type reactor, with modified forced flow for coating of tubular and porous substrate.
Pressure and flow rate data for different coating processes were gathered and gas tightness of coated samples were measured.
Gas tight coatings on the inner surfaces of mesoporous tubes and some conformal coating of mesoporous tube material were achieved in the experiments.
Some signs of flow velocity inside the tube to have effect on the film growth were indicated.

From electrical measurements it was derived that coating cross-sectional area on the inner surface of the tube was approximately three times larger than what could be derived from theoretical film growth rate and from the tube's inner diameter.
Larger than expected cross sectional area of the coating is explained as uncontrolled film growth on the inner surface of the tube, or improved surface area of the coating resulting from thin film conform the rough inner surface of the tube.
Suggestions to improve process control and conformal coating of porous tube material are also presented.
Abstract (fin): Työssä tutkittiin atomikerroskasvatusmenetelmän soveltuvuutta robustien ja suorituskykyisten hapen tuotannossa käytettävien yhdistetyn ioni-elektronijohtavien kalvojen valmistukseen.
Ei toiminnallisia, tiiviita kalvoja kasvatettiin mesohuokoisen putkimaisen alumiinioksidisubstraatin sisäpinnalle ja lisäksi suoritettiin kokeita mesohuokoisen materiaalin kauttaaltaan pinnoittamiseksi.

Koepinnoitukset tehtiin käyttäen virtaus-tyyppistä reaktoria modifioidulla pakotetulla virtauksella putkimaiselle ja huokoiselle substraatille.
Pinnoitusprosessien paine ja virtaamatieto tallennettiin ja pinnoitettujen näytteiden painetiiveys mitattiin.
Kaasutiiviiden pinnoitusten valmistaminen huokoisen putken sisälle onnistui ja lisäksi mesohuokoisen materiaalin kauttaaltaan pinnoittaminen onnistui testeissä osittain.
Joitakin merkkejä kaasun virtausnopeuden vaikutuksesta atomikerroskasvatuksen onnistumiseen havaittiin.

Sähköisten mittausten perusteella pinnoitusten poikkiala putken sisäpinnalla oli noin kolminkertainen verrattuna teoreettiseen materiaalin kasvunopeuteen ja putken halkaisijaan.
Odotettua suurempi pinnoitteen poikkiala on selitettävissä hallitsemattomalla kalvonkasvulla tai kohentuneella kalvon pinta-alalla, joka on seurausta kalvon myötäilemisestä putken sisäpinnan epätasaisuuksia.
Ehdotuksia prosessin hallinnan parantamiseksi ja huokoisen putkimateriaalin kauttaaltaan pinnoittamisen tehostamiseksi esitetään.
ED:2012-07-04
INSSI record number: 44784
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