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Author:Lapinsuo, Sakari
Title:Thin film coatings by atomic layer deposition for improvement of the flexural strength of glass
Atomikerroskasvatuksella valmistettujen ohutkalvopinnoitteiden käyttö lasin taivutuslujuuden parantamisessa
Publication type:Master's thesis
Publication year:2013
Pages:vii + 62      Language:   eng
Department/School:Mikro- ja nanotekniikan laitos
Main subject:Mikro- ja nanotekniikka   (S3010)
Supervisor:Tittonen, Ilkka
Instructor:Jylhä, Olli
Electronic version URL: http://urn.fi/URN:NBN:fi:aalto-201307137203
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Location:P1 Ark Aalto  959   | Archive
Keywords:ALD
atomic layer deposition
glass
strengthening
reinforcement
aluminum oxide
Al2O3
ball-on-ring
BOR
4PB
bending test
flexural strength
lasi
vahvistaminen
alumiinioksidi
taivutustesti
taivutuslujuus
Abstract (eng):This work is a study of glass strengthening by atomic layer deposition (ALD) conducted at the cleanroom facilities of Beneq Oy in Espoo, Finland.
Optimization of ALD process parameters was preceded by an investigation of best practices for testing glass, including but not limited to cutting, washing, lamination, and exural testing (including reliability analysis) of glass.
Glass substrates were encapsulated primarily with Al2O3 lms using trimethylaluminum (TMA) and H2O as precursors.
The e ect of lm thickness (between 5-100nm) and reaction temperature (100-475°C) on glass strength was studied by standardized bending tests.
Film thickness and uniformity were veri ed by ellipsometry.
The results indicated that atomic layer deposition, partly due to its reliability, repeatability, and layer thickness conformity even in large batches can be used to strengthen glass for industrial scale applications.
The amount of improvement in strength is largely dependent on the type of glass and its pre-ALD treatment.
While little improvement was achieved with chemically strengthened glass, glass without chemical strengthening showed in most cases very good or at least signi cant improvement depending on the applied test method, type of glass and the meter used for comparison.
Abstract (fin):Tämä työ käsittelee Beneq Oy:n Espoon puhdastiloissa tehtyä tutkimusta lasin vahvistamisesta atomikerroskasvatusmenetelmällä.
Ohutkalvojen kasvatuksen optimointia edelsi selvitys parhaista toimintatavoista lasin lujuuden testaamisessa, johon liittyy mm. lasin leikkaaminen, peseminen, laminointi, ja taivutuslujuuden selvittäminen (ml. luotettavuusanalyysi).
Erityyppisten lasikappaleiden pinnoille kasvatettiin pääasiassa trimetyylialumiinista (TMA) ja vedestä tehtyä alumiinioksidia (Al2O3).
Ohutkalvojen paksuuden (5-100nm) sekä niiden kasvatusprosessilämpötilan (100-475°C) vaikutusta lasin lujuuteen tutkittiin standardoiduilla taivutuskokeilla.
Kalvojen paksuudet ja niiden konformaalisuus mitattiin ellipsometrilla.
Tutkimuksen tulokset osoittivat, että atomikerros kasvatusta voidaan käyttää lasin vahvistuksessa teollisessakin mittakaavassa mm. sen luotettavuuden, toistettavuuden, ja ohutkalvon konformaalisuuden ansiosta.
Vahvistuksen määrä riippuu pitkälti lasityypistä ja lasin esikäsittelystä.
Kemiallisesti vahvistettua lasia saatiin vahvistettua vain jonkin verran, mutta sen sijaan kemiallisesti vahvistamaton lasi vahvistui entisestään suurimmassa osassa tapauksia vähintäänkin merkittävästi, riippuen testausmenetelmästä, lasityypistä, ja vertailumittarista.
ED:2013-12-02
INSSI record number: 48050
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