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| Author: | Kannisto, Klaara |
| Title: | Atomic Layer Deposition of Metal Thin Films |
| Publication type: | Bachelor's thesis |
| Publication year: | 2010 |
| Pages: | 29 Language: eng |
| Department/School: | Kemian ja materiaalitieteiden tiedekunta |
| Degree programme: | Kemian tekniikan tutkinto-ohjelma |
| Main subject: | Kemia (KE3001) |
| Supervisor: | Linnekoski, Juha |
| Instructor: | Malm, Jari ; Leskelä, Tuula |
| Electronic version URL: | http://urn.fi/URN:NBN:fi:aalto-201305164420 |
| Location: | |
| Keywords: | atomic layer deposition metal thin films semiconductor microelectronics processing |
| ED: | 2011-12-19 |
INSSI record number: 43299
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