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Author:Zhu, Zhen
Title:Optical and structural characterization of InGaN/GaN multiple quantum well structures irradiated by high energy heavy ions
Publication type:Master's thesis
Publication year:2008
Pages:v + 49      Language:   eng
Department/School:Elektroniikan, tietoliikenteen ja automaation tiedekunta
Degree programme:Elektroniikan ja sähkötekniikan tutkinto-ohjelma
Main subject:Optoelektroniikka   (S-104)
Supervisor:Sopanen, Markku
Instructor:Ali, Muhammad
Electronic version URL: http://urn.fi/urn:nbn:fi:tkk-012900
OEVS:
Electronic archive copy is available via Aalto Thesis Database.
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Location:P1 Ark S80     | Archive
Keywords:gallium nitride
indium gallium nitride
metalorganic vapor phase epitaxy
multiple quantum well
x-ray
photoluminescence
irradiation
fluence
Abstract (eng): This topic is a cooperation project between Helsinki University of Technology (TKK) and Uppsala University (UU).
Multiple quantum wells (MQWs) were grown and characterized in Department of Micro and Nanosciences of TKK.
The samples were irradiated in Ångström Laboratory of UU.

In this thesis, quantum well (QW) structures based on InGaN/GaN material system have been grown by using metalorganic vapor phase epitaxy (MOVPE).
The samples grown had 5 and 10 quantum wells with 6 and 10% of indium, respectively.
Iodine and bromine have been used as irradiations ions.
The irradiation fluences of these ions were varied from 109 to 1012 ions/cm2.

Our X-ray diffraction results have shown no signs of a major crystal damage on the quantum wells.
The photoluminescence results indicate a strong dependence of the optical properties on the type and fluence of ions used for irradiation.
ED:2009-10-19
INSSI record number: 38476
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